Case Studies

Examples of how we have supported customers with their MBE and MOCVD requirements.

GaAs/AlAs DBRs – Wafer Mapping

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~100% Reflectivity,  & Excellent Uniformity MOCVD grown DBRs, developing our VECSEL technologies, were assessed in terms of wafer uniformity. Excellent…

Advanced InP Re-Growth

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InP photonic crystal surface emitting laser (PCSEL) Very high aspect ratio features Significant experience and research in MOCVD epitaxial re-growth…

InP Buried-Heterostructures

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This core MOCVD technology is applied to InP devices and PICs for engineering symmetric far-fields, ensuring efficient heat-extraction, and in…

InP DFB Re-Growth

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Iteration of MOCVD epitaxial re-growth, TEM structural characterisation, and device test of re-grown devices allows process development and transfer to…

Mid IR-DBRs

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AlSb/GaInSb RCLED at ~4.25µm Broad area lasers have exhibited Jth=1.3 kAcm-2 In order to maximise extraction efficiency and engineer a…

Low Density Quantum Dots

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Single InAs QD required for physics studies Vary QD density across wafer by stopping rotation of wafer Phys. Rev. Lett.…

InSb Photo-Pixel & GaAs MESFET

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AlInSb photo-detector GaAs MESFET GaAs substrate Xie, C., et al. (2015) . IEEE Transactions on Electron Devices, 62(12), pp. 4069-4075.…

Multi-Spectral MIR LED

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4x Colour MIR LED Grown on GaAs APL 111, (10),  102102.   DOI: 10.1063/1.4986396 To allow future integration with GaAs based…

MIR LEDs & Photodiode – On Silicon

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Full p-i-n structure grown on Si Electroluminescence ~4.25 μm III-V epitaxy on silicon processes have been developed to produce antimonide…

AlInGaAsSb Inter-band Lasers

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Preliminary results – RT operation demonstrated With the R&D team of a leading laser manufacturer, we developed MBE epitaxial processes…

MBE Capabilities

VEECO GEN3 Systems Group III: Ga In and Al Group V : As, Sb, P Dopant : Si,Te (n), Be…

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or email us at info@iii-vepi.com

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